Sub-100-nm-Scale Patterning Using a Low-Energy Electron Beam-Reference-Cited by-同舟云学术

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Sub-100-nm-Scale Patterning Using a Low-Energy Electron Beam

Published:1992-06-01 Issue:Part 2, No. 6A Volume:31 Page:L744-L746
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ishii Kiyoshi,Matsuda Tadahito

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabricating a silicon nanowire by using the proximity effect in electron beam lithography for investigation of the Coulomb blockade effect;Nanotechnology;2010-12-09

2. Fabrication of a three-dimensional nanoimprint mold by using electron beam lithography with consideration of the proximity effect;Journal of Physics: Conference Series;2008-03-01

3. Fabrication of three-dimensional nanoimprint mold using inorganic resist in low accelerating voltage electron beam lithography;Microelectronic Engineering;2007-05

4. Low-energy electron beam lithography with 30 nm resolution;Semiconductor Science and Technology;1993-07-01

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