X-Ray Phase-Shifting Mask for 0.1-µm Pattern Replication under a Large Proximity Gap Condition

Author:

Somemura Yoh,Deguchi Kimiyoshi,Miyoshi Kazunori,Matsuda Tadahito

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 26 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Artificial Patterning of Nanostructures;Handbook of Nanophase and Nanostructured Materials;2003

2. Proximity X-ray and extreme ultraviolet lithography;Comptes Rendus de l'Académie des Sciences - Series IV - Physics;2000-09

3. X-ray imaging: applications to patterning and lithography;Journal of Physics D: Applied Physics;2000-05-31

4. Studies on Defect Inspectability and Printability Using Programmed-Defect X-Ray Mask;Japanese Journal of Applied Physics;1999-12-30

5. Optimum Phase Condition for Low-Contrast X-Ray Masks;Japanese Journal of Applied Physics;1999-12-30

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