Metalorganic Vapor Phase Epitaxy of GaN, InN, and AlGaN Using 1,1-Dimethylhydrazine as a Nitrogen Source
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Reference20 articles.
1. MOVPE growth of cubic GaN on GaAs using dimethylhydrazine
2. Surface Morphology and Carbon Incorporation for Hexagonal GaN/(111)B GaAs Metalorganic Vapor Phase Epitaxy Using Dimethylhydrazine and Trimethylgallium
3. Pyrolysis of 1,1 dimethylhydrazine for OMVPE growth
4. The Role of Growth Rates and Buffer Layer Structures for Quality Improvement of Cubic GaN Grown on GaAs
5. Pyrolysis of dimethylhydrazine and its co-pyrolysis with triethylgallium
Cited by 6 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Metal organic vapour phase epitaxy of AlN, GaN, InN and their alloys: A key chemical technology for advanced device applications;Coordination Chemistry Reviews;2013-07
2. Milliwatt-class non-polar a-plane InGaN/GaN light-emitting diodes grown directly on r-plane sapphire substrates;Current Applied Physics;2010-11
3. Metalorganic vapor phase epitaxy of InN on GaN using tertiary-butylhydrazine as nitrogen source;Journal of Crystal Growth;2010-06
4. Recent advances in the MOVPE growth of indium nitride;physica status solidi (a);2009-12-10
5. MOVPE growth of InN films using 1,1-dimethylhydrazine as a nitrogen precursor;Journal of Crystal Growth;2009-05
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