Discharge Produced Plasma Extreme Ultra-Violet Source with Hollow Cathode-Reference-Cited by-同舟云学术

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Discharge Produced Plasma Extreme Ultra-Violet Source with Hollow Cathode

Published:2007-05-11 Issue:No. 19 Volume:46 Page:L446-L447
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Oshima Nobuaki,Kimura Toru,Jiang Weihua

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference7 articles.

1. Miniature hybrid plasma focus extreme ultraviolet source driven by 10kA fast current pulse

2. Formation of a High-Density Deuterium Plasma Focus

3. Plasma focus x-ray source for lithography

4. Progress toward use of a dense plamsa focus as a light source for production EUV lithography

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Generation of collimated extreme ultraviolet radiation by single-photon process;Optics Communications;2023-10

2. Materials for Optical Lithography Tool Application;Annual Review of Materials Research;2009-08-01

3. Light Sources and Lighting Circuits;Journal of Light & Visual Environment;2008

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