Target Erosion Pattern in Planar Magnetron Sputtering
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 11 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Development of New Magnetron Sputter Deposition Processes for Laser Target Fabrication;Fusion Science and Technology;2023-05-01
2. Gold-tantalum alloy films deposited by high-density-plasma magnetron sputtering;Journal of Applied Physics;2021-10-28
3. Transient evolution of the target erosion profile during magnetron sputtering: Dependence on gas pressure and magnetic configuration;Surface and Coatings Technology;2017-10
4. The influence of target erosion on the mass spectra of clusters formed in the planar DC magnetron sputtering source;Surface and Coatings Technology;2012-12
5. Target utilization of planar magnetron sputtering using a rotating tilted unbalanced yoke magnet;Vacuum;2009-09
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