Electron Beam Vacuum Lithography Using a Plasma Co-Polymerized MMA–TMT Resist-Reference-Cited by-同舟云学术

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Electron Beam Vacuum Lithography Using a Plasma Co-Polymerized MMA–TMT Resist

Published:1982-05-20 Issue:Part 1, No. 5 Volume:21 Page:768-771
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Yamada Masao,Tamano Junji,Yoneda Katsumi,Morita Shinzo,Hattori Shuzo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 31 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nanoscale Pattern Definition on Nonplanar Surfaces Using Ion Beam Proximity Lithography and Conformal Plasma-Deposited Resist;Journal of Microelectromechanical Systems;2008-06

2. Surface organic modification of inorganic substrates by plasma deposition of tin oxide organic-like thin films and grafting polymerization;Surface and Coatings Technology;2006-02

3. Air-Gap Fabrication Using a Sacrificial Polymeric Thin Film Synthesized via Initiated Chemical Vapor Deposition;Journal of The Electrochemical Society;2006

4. Effect of Substrate Temperature on the Plasma Polymerization of Poly(methyl methacrylate);Chemical Vapor Deposition;2006-01

5. Initiated CVD of Poly(methyl methacrylate) Thin Films;Chemical Vapor Deposition;2005-10

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