Nanoscale Pattern Definition on Nonplanar Surfaces Using Ion Beam Proximity Lithography and Conformal Plasma-Deposited Resist-Reference-Cited by-同舟云学术

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Nanoscale Pattern Definition on Nonplanar Surfaces Using Ion Beam Proximity Lithography and Conformal Plasma-Deposited Resist

Published:2008-06 Issue:3 Volume:17 Page:735-740
ISSN:1057-7157
Container-title:Journal of Microelectromechanical Systems
language:
Short-container-title:J. Microelectromech. Syst.

Author:

Parikh Dhara,Craver Barry,Nounu Hatem N.,Fong Fu-On,Wolfe John C.

Publisher

Institute of Electrical and Electronics Engineers (IEEE)

Subject

Electrical and Electronic Engineering,Mechanical Engineering

Link

http://xplorestaging.ieee.org/ielx5/84/4538081/04538093.pdf?arnumber=4538093

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fabrication Methods for Microfluidic Devices: An Overview;Micromachines;2021-03-18

2. High-brightness source of energetic He atoms;Journal of Vacuum Science & Technology B;2020-01

3. The detection of empty resist bottles or air in the resist lines of a photolithography coating tool;International Journal of Computer Integrated Manufacturing;2014-12-06

4. Ion Beam Instruments Used for Nanomanufacturing;Handbook of Manufacturing Engineering and Technology;2014-09-30

5. Nanopatterning by Laser Interference Lithography: Applications to Optical Devices;Journal of Nanoscience and Nanotechnology;2014-02-01

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