Sputtering Behavior of Boron Using Electron Cyclotron Resonance Plasma-Reference-Cited by-同舟云学术

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Sputtering Behavior of Boron Using Electron Cyclotron Resonance Plasma

Published:1994-10-15 Issue:Part 1, No. 10 Volume:33 Page:5959-5966
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Ito Yoshifumi,Kuriki Shunichi,Saidoh Masahiro,Nishikawa Masahiro

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 5 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. A New Approach to the Deposition of Elemental Boron and Boron-Based Coatings by Pulsed Magnetron Sputtering of Loosely Packed Boron Powder Targets;Plasma Processes and Polymers;2007-04

2. Preparation of self-supporting boron films by sputtering with electron-beam-excited plasma;Vacuum;2004-06

3. Process diagnostics during the deposition of cubic boron nitride;Surface and Coatings Technology;1997-04

4. Spectroscopic measurement of kinetic energy of sputtered boron in electron cyclotron resonance plasma;Journal of Nuclear Materials;1997-02

5. Sputtering Yields;Topics in Applied Physics

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