Ultrasoft X-Ray Emission Spectroscopic Analysis for Effects of Vacuum Ultraviolet Rare Gas Excimer Laser Irradiation on Silicon Nitride Films-Reference-Cited by-同舟云学术

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Ultrasoft X-Ray Emission Spectroscopic Analysis for Effects of Vacuum Ultraviolet Rare Gas Excimer Laser Irradiation on Silicon Nitride Films

Published:1994-11-01 Issue:Part 2, No. 11A Volume:33 Page:L1549-L1551
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kurmaev Ernst Z.,Shamin Sergei N.,Dolgih Vitalij E.,Kurosawa Kou,Nakamae Kazuo,Takigawa Yasuo,Kameyama Akihiro,Yokotani Atsushi,Sasaki Wataru

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. X-ray fluorescence study of organic-inorganic polymer conversion into ceramics induced by ion irradiation;Physical Review B;1999-12-01

2. Studies of Solid Interfaces Using Soft X-ray Emission Spectroscopy;Critical Reviews in Solid State and Materials Sciences;1998-06

3. Application of high energy resolved X-ray emission spectroscopy for monitoring of silicide formation in Co/SiO2/Si system;Thin Solid Films;1997-12

4. The influence of high-energy electron irradiation and boron implantation on the oxide thickness in the /Si system;Journal of Physics: Condensed Matter;1997-08-11

5. Local structure of porous silicon studied by means of X-ray emission spectroscopy;Applied Physics A: Materials Science & Processing;1997-08-01

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