Nanoscale Stress Field Evaluation with Shallow Trench Isolation Structure Assessed by Cathodoluminescence Spectroscopy, Raman Spectroscopy, and Finite Element Method Analyses-Reference-Cited by-同舟云学术

Nanoscale Stress Field Evaluation with Shallow Trench Isolation Structure Assessed by Cathodoluminescence Spectroscopy, Raman Spectroscopy, and Finite Element Method Analyses

Published:2008-04-25 Issue:4 Volume:47 Page:2506-2510
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Kodera Masako,Iguchi Tadashi,Tsuchiya Norihiko,Tamura Mizuki,Kakinuma Shigeru,Naka Nobuyuki,Kashiwagi Shinsuke

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Reference4 articles.

1. Localized Oxidation of the Cu Surface after Chemical Mechanical Planarization Processing

2. Penetration and energy-loss theory of electrons in solid targets

3. Optically active oxygen-deficiency-related centers in amorphous silicon dioxide

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