Observation of Sputtered Si Surface Irradiated with Metal Cluster Complex Ions-Reference-Cited by-同舟云学术

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Observation of Sputtered Si Surface Irradiated with Metal Cluster Complex Ions

Published:2006-06-20 Issue:6B Volume:45 Page:5528-5530
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Teranishi Yoshikazu,Kondou Kouji,Fujiwara Yukio,Nonaka Hidehiko,Tomita Misuhiro,Yamamoto Kazuhiro,Fujimoto Toshiyuki,Ichimura Shingo

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 10 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ion Beam Generation from an Electrolyte Solution Containing Polyatomic Cations and Anions for Secondary Ion Mass Spectrometry;Japanese Journal of Applied Physics;2009-12-21

2. Metal cluster complex primary ion beam source for secondary ion mass spectrometry (SIMS);Vacuum;2009-12

3. Production and Applications of Metal-cluster-complex Ion Beams;Journal of the Vacuum Society of Japan;2009

4. Cluster SIMS using metal cluster complex ions;Applied Surface Science;2008-12

5. Semiconductor profiling with sub-nm resolution: Challenges and solutions;Applied Surface Science;2008-12

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