Multi-Beam Concepts for Nanometer Devices-Reference-Cited by-同舟云学术

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Multi-Beam Concepts for Nanometer Devices

Published:1989-10-20 Issue:Part 1, No. 10 Volume:28 Page:2058-2064
ISSN:0021-4922
Container-title:Japanese Journal of Applied Physics
language:en
Short-container-title:Jpn. J. Appl. Phys.

Author:

Lischke B.,Bennecke W.,Brunner M.,Herrmann K. H.,Heuberger A.,Knapek E.,Schäffer P.,Schnakenberg U.

Publisher

IOP Publishing

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Roadmap for focused ion beam technologies;Applied Physics Reviews;2023-12-01

2. Characterization of CMOS programmable multi-beam blanking arrays as used for programmable multi-beam projection lithography and resistless nanopatterning;Journal of Micromechanics and Microengineering;2011-03-24

3. Large-field particle beam optics for projection and proximity printing and for maskless lithography;Journal of Micro/Nanolithography, MEMS, and MOEMS;2003-01-01

4. Large-field ion optics for projection and proximity printing and for maskless lithography (ML2);Emerging Lithographic Technologies VI;2002-07-05

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