Simulation of X-Ray Mask Repair by Means of FIB-Technology
Author:
Publisher
IOP Publishing
Subject
General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Ion beams in silicon processing and characterization;Journal of Applied Physics;1997-05-15
2. A macroscopic model for focused‐ion‐beam‐induced deposition;Journal of Applied Physics;1993-08
3. Focused-ion-beam-induced tungsten deposition for IC repair;Microelectronic Engineering;1993-04
4. Materials Issues In X-Ray Mask Repair by Focused Ion Beams;MRS Proceedings;1993
5. The technology of finely focused ion beams;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1991-04
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