Plasma Chemical Vapor Deposition (Pcvd)
Author:
Publisher
Taylor & Francis
Link
http://www.crcnetbase.com/doi/pdf/10.1201/9781420034127.ch24
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Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Pressure limitation of electron density measurement using a wave-cutoff method in weakly ionized plasmas;Physics of Plasmas;2008-12
2. Wave transmission characteristics of a wave-cutoff probe in weakly ionized plasmas;Physics of Plasmas;2007-09
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