Lithographic Evaluation of Chemically Amplified Molecular Resist for below 22nm Resolution-Reference-Cited by-同舟云学术

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Lithographic Evaluation of Chemically Amplified Molecular Resist for below 22nm Resolution

Published:2009 Issue:6 Volume:22 Page:737-741
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Shiono Daiju,Hada Hideo,Sato Kazufumi,Fukushima Yasuyuki,Watanabe Takeo,Kinoshita Hiroo

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/22/6/22_6_737/_pdf

Reference11 articles.

1. 1. ITRS Roadmap [http://www.itrs.net].

2. Novel class of low molecular‐weight organic resists for nanometer lithography

3. 3. S. Hattori, S. Saito, K. Asakawa, T. Koshiba, T. Nakasugi., Proc, SPIE 6923 (2008) 69230J.

4. 4. S. Tanaka, M. Murakami, K. Fukushima, N. Kawano, Y. Uenoyama, K. Ito, H. Ohno, N. Matsumoto., Proc, SPIE 7273 (2009) 72732M.

5. 5. K. Okuyama., Proc, SPIE 7273 (2009) 72732U.

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Highly robust electron beam lithography lift-off process using chemically amplified positive tone resist and PEDOT:PSS as a protective coating;Journal of Micromechanics and Microengineering;2014-08-06

2. EUV Resist Chemical Reaction Analysis using SR;Journal of Photopolymer Science and Technology;2013

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