Impact of De-molding Force on Exposure Dosage in UV-Nanoimprint Process-Reference-Cited by-同舟云学术

Impact of De-molding Force on Exposure Dosage in UV-Nanoimprint Process

Published:2009 Issue:2 Volume:22 Page:181-184
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Fujii Noriyoshi,Tanabe Toshiaki,Hirasawa Tamano,Kawata Hiroaki,Sakai Nobuji,Hirai Yoshihiko

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/22/2/22_2_181/_pdf

Reference8 articles.

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2. 2. I. Yoneda, S. Mikami, M. Ito, T. Nakasugi, and T. Higashiki, Book of abstract of Intl. Conf. on Micro- and Nano Engineering (2007 Copenhagen) 43.

3. 3. N. Sakai and T. Hirasawa, Jpn. J. Polymer Sci. and Technol., 66, (2009) 88.

4. Photo-curable Resins and the Evaluation Methods for UV-Nanoimprint Lithography

5. Nanoimprint Materials Systems

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