Author:
Takahara Shigeru,Nishizawa Naoto,Tsumita Tomoaki
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference20 articles.
1. NATURE OF THE EXCITED TRIPLET STATES IN THE PHOTOLYSIS OFO-ACYLOXIMES
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4. Characterization of Fluoropolymer Resist for 157-nm Lithography
5. Novel Photoacid Generators for ArF Dry and Immersion Lithography: Application-Related Properties
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