Observation of Swelling Behavior of ArF Resist during Development by using QCM Method (2)-Reference-Cited by-同舟云学术

Observation of Swelling Behavior of ArF Resist during Development by using QCM Method (2)

Published:2012 Issue:4 Volume:25 Page:467-472
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Sekiguchi Atsushi,Konishi Hiroko,Isono Mariko

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/25/4/25_467/_pdf

Reference10 articles.

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2. [2] William Hinsberg, Seok-won Lee, Hiroshi Ito, Donald Horne, Kay Kanazawa, “Experimental approaches for assessing interfacial behavior of polymer films during dissolution in aqueous base“, SPIE Proc. 4345, 1 (2001).

3. [3] Thomas Wallow, Wendy Chan, William Hinsberg, Seok-Won Lee, “Characterization of the Polymer-Developer Interface in 193nm Photoresist Polymers and Formulations During Dissolution”, SPIE Proc. 4690, 299 (2002).

4. [4] Minoru Toriumi, Toshio Itani, “Dissolution characteristics of resist polymers studied by Quartz Crystal Microbalance transmission-line analysis and PKa acidity analysis”, SPIE Proc. 4690, 904 (2002).

5. [5] Hiroshi Ito, William D. Hinsberg, Larry F. Rhodes, Chun Chnag, “Hydrogen bonding and aqueous base dissolution behavior of hexafluoroisopropanol-bearing polymers”, SPIE Proc. 5039, 70 (2003).

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