Multi-Layer Thick Resist Process Using Liquid-Crystal-Display Projection Exposure and Vacuum Treatment Process
Author:
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
https://www.jstage.jst.go.jp/article/photopolymer/25/4/25_455/_pdf
Reference14 articles.
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3. [3] T. Hayashi, T. Shibata, T. Kawashima, E. Makino, T. Mineta, T. Masuzawa: Sensors and Actuators A 144 (2008) 381-388.
4. [4] T. Horiuchi and A. Otani: Optical Review, 14 (2007) 224-230.
5. [5] T. Horiuchi, H. Kobayashi: Microelectronic Engineering 43-52 (2004) 48-52.
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1. Two-layer resist process for printing thick patterns by exploiting a maskless projection exposure system using a liquid-crystal-display panel;Japanese Journal of Applied Physics;2020-03-06
2. Pattern Width Homogenization in the Field of Liquid-Crystal-Display Matrix Exposure by Adjusting Each Cell Transmittance;Journal of Photopolymer Science and Technology;2016
3. Simple maskless lithography tool with a desk-top size using a liquid-crystal-display projector;Microelectronic Engineering;2015-06
4. Projection exposure using a projector with highly minute liquid crystal display panels;SPIE Proceedings;2013-06-28
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