Author:
Mark Neisser,Cho Kyoungyong,Petrillo Karen
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference29 articles.
1. 1a). See for example, C. Mack et al., “Stochastic Exposure Kinetics of EUV Photoresists: A simulation Study”, J. Micro/Nanolithography, MEMS, and MOEMS 10(3), 033019 (Jul-Sep 2011).
2. b) W. Gao et al., “Calibration and Verification of a Stochastic Model for EUV Resist6rdquo;, Presented at Synopsys SPIE Symposium. 2012.
3. 2. For example see the k1 values shown in the ITRS roadmap for semiconductors available at www.itrs.net.
4. 3. R. Dammel, “Photoresists For Microlithography, or The Red Queens Race”, Proc. SPIE Microlithography, 4690 (2002).
5. 4. Atomic scattering factors are available by element and photon energy in eV at http://henke.lbl.gov/optical_constants/asf.html. A wavelength of 13.4nm corresponds to 92.4 eV.
Cited by
17 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献