Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography-Reference-Cited by-同舟云学术

Role of low-energy electrons in the solubility switch of Zn-based oxocluster photoresist for extreme ultraviolet lithography

Published:2021 Issue:31 Volume:23 Page:16646-16657
ISSN:1463-9076
Container-title:Physical Chemistry Chemical Physics
language:en
Short-container-title:Phys. Chem. Chem. Phys.

Author:

Rohdenburg Markus¹²³⁴⁵^ORCID,Thakur Neha⁶⁷⁸^ORCID,Cartaya René¹²³,Castellanos Sonia⁶⁷⁸^ORCID,Swiderek Petra¹²³^ORCID

Affiliation:

1. Institute for Applied and Physical Chemistry (IAPC), Fachbereich 2 (Chemie/Biologie), University of Bremen

2. 28359 Bremen

3. Germany

4. Wilhelm-Ostwald-Institute for Physical and Theoretical Chemistry (WOI), Leipzig University

5. 04103 Leipzig

6. Advanced Research Center for Nanolithography

7. Amsterdam 1098 XG

8. The Netherlands

Abstract

Electron-induced reactions make an important contribution to the solubility switch of a novel Zn oxocluster resist in extreme ultraviolet lithography (EUVL). The study also gives direct evidence that chain reactions are involved in this process.

Funder

Horizon 2020

Vrije Universiteit Amsterdam

Nederlandse Organisatie voor Wetenschappelijk Onderzoek

Publisher

Royal Society of Chemistry (RSC)

Subject

Physical and Theoretical Chemistry,General Physics and Astronomy

Link

http://pubs.rsc.org/en/content/articlepdf/2021/CP/D1CP02334A

Reference44 articles.

1. R. A. Lawson and A. P. G.Robinson , Frontiers of Nanoscience , Elsevier Ltd , 2016 , vol. 11, pp. 1–90

2. O. R. Wood and H. Kinoshita , in EUV Lithography , ed. V. Bakshi , SPIE , Washington , 2nd edn, 2018 , pp. 1–56

3. Lithography gets extreme

4. Extreme ultraviolet resist materials for sub-7 nm patterning

5. The Physics of EUV Photoresist and How It Drives Strategies for Improvement

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