1. 1. Gallatin, G. M., Naulleau, P., and Brainard, R. L., Proc. SPIE, 6519, 651911/1-651911/10 (2007).
2. 2. Harned, N., presented at IEUVI Resist TWG in Miami (2011).
3. 3. Grantham, S., Tarrio, C., Hill, S. B., Richter, L. J., Lucatorto, T. B., Van Dijk, J., Kaya, C., Harned, N., Hoefnagels, R., Silova, M., and Steinhoff, J., Proc. SPIE, 7969, 79690K (2011).
4. 4. Hill, S. B., Faradzhev, N., Richter, L. J., Tarrio, C., Grantham, S., Vest, R., and Lucatorto, T. B., presented at 2011 International Symposium on Extreme Ultraviolet Lithography in Miami (2011).
5. 5. Pollentier, I., Neira, I., and Gronheid, R., Proc. SPIE, 7972, 797208 (2011).