1. S. Mikami et al., SPIE Advanced Lithography 2016, 9776–91 (2016).
2. E. Shiobara et al., International Symposium on EUV Lithography, Hiroshima, Japan, P-RE-01, (2016).
3. M. Kerkhof et al., Proc. of SPIE Vol. 10143, 101430D (2017).
4. O. Yildirim et al., Proc. of SPIE Vol. 10143, 101430Q (2017).
5. NXE resist outgas testing update;Harned,2011