UV-based Nanoimprint Lithography: Toward Direct Patterning of Functional Polymers-Reference-Cited by-同舟云学术

UV-based Nanoimprint Lithography: Toward Direct Patterning of Functional Polymers

Published:2012 Issue:2 Volume:25 Page:197-206
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Kirchner R.¹,Finn A.¹,Landgraf R.¹²,Nueske L.²,Vogler M.³,Fischer W.-J.¹²

Affiliation:

1. Technische Universitate Dresden, Institute of Semiconductors and Microsystems

2. Fraunhofer Institute for Photonic Microsystems

3. Micro Resist Technology GmbH

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/25/2/25_197/_pdf

Reference24 articles.

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3. 3. A. Finn, A. Jahn, R. Kirchner, U. K?nzelmann, J. He, M. Waegner, W.-J. Fischer, 3rd GMM Workshop Mikro-Nano-Integration, GMM Fachbericht 68 (2011), VDE Verlag GmbH, ISBN 978-3-8007-3334-7, 8 [in English].

4. 4. A. Schleunitz, H. Schift, J. Micromech. Microeng., 20 (2010), 095002.

5. 5. Y. Ofir, I. W. Moran, Ch. Subramani, K. R. Carter and V. M. Rotello, Adv. Mater., 22 (2010), 3608.

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