Application for WLP at positive working photosensitive polybenzoxazole.
Author:
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Link
http://www.jstage.jst.go.jp/article/photopolymer1988/15/2/15_2_173/_pdf
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1. Polyimides for Micro-electronics Applications;Polyimide [Working Title];2021-09-21
2. Novel Photoresist using Photodeprotectable N-Alkoxybenzyl Aromatic Polyamide;Journal of Photopolymer Science and Technology;2018-06-25
3. Next Generation Photosensitive Dielectric Materials for Advanced Packaging Applications;Journal of Photopolymer Science and Technology;2018-06-25
4. Design and preparation of porous polybenzoxazole films using the tert-butoxycarbonyl group as a pore generator and their application for patternable low-k materials;Polym. Chem.;2012
5. Novel Partial Esterification Reaction in Poly(amic acid) and Its Application for Positive-Tone Photosensitive Polyimide Precursor;Polymer Journal;2009
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