Novel Approach for the Improvement of Post Exposure Delay Stability in ArF Resist Composed of Alicyclic Polymer.-Reference-Cited by-同舟云学术

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Novel Approach for the Improvement of Post Exposure Delay Stability in ArF Resist Composed of Alicyclic Polymer.

Published:1999 Issue:3 Volume:12 Page:469-476
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Jung Jae-Chang,Kim Hyeong-Soo,Baik Ki-Ho

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer1988/12/3/12_3_469/_pdf

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Stereo-Selective Synthesis of exo-Norbornene Derivatives for Resist Materials.;Journal of Photopolymer Science and Technology;2009

2. Porous organic–inorganic hybrids for removal of amines via donor–acceptor interaction;Materials Chemistry and Physics;2006-02

3. Novel high-performance ArF resist for sub-100-nm lithography;SPIE Proceedings;2001-08-24

4. High sensitive negative silylation process for 193nm lithography;Microelectronic Engineering;2000-06

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