Evaluation of Decomposition Property of Photoresist by Oxygen Radicals Using Helium-Oxygen Mixtures-Reference-Cited by-同舟云学术

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Evaluation of Decomposition Property of Photoresist by Oxygen Radicals Using Helium-Oxygen Mixtures

Published:2020-07-01 Issue:4 Volume:33 Page:433-437
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Yamamoto Masashi¹,Akita Koki¹,Nagaoka Shiro²,Umemoto Hironobu³⁴,Horibe Hideo⁴

Affiliation:

1. Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College

2. Department of Electronic Systems Engineering, National Institute of Technology, Kagawa College

3. Shizuoka University

4. Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/33/4/33_433/_pdf

Reference19 articles.

1. 1. H. Morinaga, T. Futatsuki, T. Ohmi, E. Fuchita, M. Oda, and C. Hayashi, J. Electrochem. Soc., 142 (1995) 966.

2. 2. K. Hirose, H. Shimada, S. Shimomura, M. Onodera, and T. Ohmi, J. Electrochem. Soc., 141 (1994) 192.

3. 3. M. Yamamoto, H. Horibe, H. Umemoto, K. Takao, E. Kusano, M. Kase, and S. Tagawa, Jpn. J. Appl. Phys., 48 (2009) 026503.

4. 4. M. Yamamoto, H. Umemoto, K. Ohdaira, S. Nagaoka, T. Shikama, T. Nishiyama, and H. Horibe, J. Photopolym. Sci. Technol., 28 (2015) 303.

5. 5. H. Umemoto and M. Moridera, J. Appl. Phys., 103 (2008) 034905.

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