Enhancement of Photoresist Removal Rate by Using Atomic Hydrogen Generated under Low-pressure Conditions-Reference-Cited by-同舟云学术

Enhancement of Photoresist Removal Rate by Using Atomic Hydrogen Generated under Low-pressure Conditions

Published:2015 Issue:2 Volume:28 Page:303-306
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Yamamoto Masashi¹,Umemoto Hironobu²,Ohdaira Keisuke³,Nagaoka Shiro⁴,Shikama Tomokazu¹,Nishiyama Takashi⁵,Horibe Hideo⁵

Affiliation:

1. Department of Electrical and Computer Engineering, National Institute of Technology, Kagawa College

2. Applied Chemistry and Biochemical Engineering Course, Graduate School of Integrated Science and Technology, Shizuoka University

3. Green Devices Research Center, Japan Advanced Institute of Science and Technology

4. Department of Electronic Systems Engineering, National Institute of Technology, Kagawa College

5. Department of Applied Chemistry and Bioengineering, Graduate School of Engineering, Osaka City University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/28/2/28_303/_pdf

Reference26 articles.

1. 1. T. W. Hickmott, J. Chem. Phys., 32 (1960) 810.

2. 2. J. N. Smith, Jr., W. L. Fite, J. Chem. Phys., 37 (1962) 898.

3. 3. H. Umemoto, Chem. Vapor Deposition, 16 (2010) 275.

4. 4. J. I. Pankove, N. M. Johnson, in Hydrogen in Semiconductors, Ed. R. K. Willardson and A. C. Beer (Academic Press, San Diego, CA, 1991) Semiconductors and Semimetals, Vol. 34, p. 110.

5. 5. R. Z. Bachrach, R. D. Bringans, J. Vac. Sci. Technol. B, 1 (1983) 142.

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Surface Modification of Fluoropolymers by Atomic Hydrogen;Journal of Photopolymer Science and Technology;2023-06-15

2. Surface Cleaning and Modification of Oxide Films by Atomic Hydrogen Annealing;Journal of Photopolymer Science and Technology;2022-12-16

3. Removal of Novolac Photoresist with Various Concentrations of Photo-active Compound Using H₂/O₂ Mixtures Activated on a Tungsten Hot-wire Catalyst;Journal of Photopolymer Science and Technology;2021-06-11

4. Protrusion Formation of Polymer Surface by Atomic Hydrogen Annealing;Journal of Photopolymer Science and Technology;2021-06-11

5. Evaluation of Decomposition Property of Photoresist by Oxygen Radicals Using Helium-Oxygen Mixtures;Journal of Photopolymer Science and Technology;2020-07-01