Lithography Process Simulations using OCTA -Application to Development and DSA-Reference-Cited by-同舟云学术

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Lithography Process Simulations using OCTA -Application to Development and DSA

Published:2014 Issue:1 Volume:27 Page:25-29
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Morita Hiroshi

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/27/1/27_25/_pdf

Reference16 articles.

1. 1. M. Doi et al., http://octa.jp

2. 2. H. Morita, M. Doi, Proc. SPIE, 7273 (2009) 727337.

3. 3. H. Morita, M. Doi, Proc. SPIE, 7639 (2010)763932.

4. 4. H. Morita, Proc. SPIE, 7972 (2011)79720W.

5. 5. H. Morita, I. Okabe, S. Agarwal, V. K. Singh, Proc. SPIE, 8325 (2012) 83250J.

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