Selective Dissolution Resistance Control of EUV Photoresist Using Multiscale Simulation: Rational Design of Hybrid System
Author:
Affiliation:
1. Institute of Advanced Machines and Design, Seoul National University, Seoul, Republic of Korea
2. Division of Multiscale Mechanical Design, School of Mechanical and Aerospace Engineering, Seoul National University, Seoul, Republic of Korea
Funder
National Research Foundation of Korea
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Inorganic Chemistry,Polymers and Plastics,Organic Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/acs.macromol.9b02378
Reference84 articles.
1. Molecular Glass Resists as High-Resolution Patterning Materials
2. Semiconductor Logic Technology Innovation to Achieve Sub-10 nm Manufacturing
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