Relationships between Stochastic Phenomena and Optical Contrast in Chemically Amplified Resist Process of Extreme Ultraviolet Lithography-Reference-Cited by-同舟云学术

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Relationships between Stochastic Phenomena and Optical Contrast in Chemically Amplified Resist Process of Extreme Ultraviolet Lithography

Published:2014 Issue:1 Volume:27 Page:11-19
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Kozawa Takahiro,Santillan Julius Joseph,Itani Toshiro

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/27/1/27_11/_pdf

Reference41 articles.

1. 1. S. Wurm, Jpn. J. Appl. Phys., 46 (2007) 6105.

2. 2. T. Itani, J. Photopolym. Sci. Technol., 24 (2011) 111.

3. 3. K. Maruyama, H. Nakagawa, S. Sharma, Y. Hishiro, M. Shimizu, and T. Kimura, Proc. SPIE, 8325 (2012) 83250A.

4. 4. H. Tsubaki, S. Tarutani, N. Inoue, H. Takizawa, and T. Goto, Proc. SPIE, 8679 (2013) 867905.

5. 5. Y. Ekinci, M. Vockenhuber, M. Hojeij, L. Wang, and N. Mojarad, Proc. SPIE, 8679 (2013) 867910.

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Design strategy of extreme ultraviolet resists;Japanese Journal of Applied Physics;2024-05-01

2. Surface Tension Driven Flow in a Low Molecular Weight Photopolymer;Journal of Photopolymer Science and Technology;2015

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