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Enhanced Cleaning for the Point-of-Use Filter and its Effectiveness on Wafer Defectivity in Immersion ArF Lithography Process

  • Published:2017 Issue:6 Volume:30 Page:639-643
  • ISSN:0914-9244
  • Container-title:Journal of Photopolymer Science and Technology
  • language:en
  • Short-container-title:J. Photopol. Sci. Technol.

Author:

Varanasi Rao1,Umeda Toru2,Mesawich Michael3,Connor Patrick1,Johnson Lawrence1

Affiliation:

1. SLS Global Technical Support, Pall Corporation

2. SLS Global Technical Support, Nihon Pall, Ltd.

3. Marketing, Pall Corporation

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Reference5 articles.

1. 1. C. Brodsky, "Beyond immersion - patterning enablers for the next decade", Semicon Europa Oral Presentation, October 2011.

2. 2. A. Sengupta, “The Future of Contamination Control & Next generation Supply Chain for <14nm Node Semiconductor Processes”, SMC 2016.

3. 3. T. Umeda, A. Morita, H. Shimizu, and S. Tsuzuki, Proc. SPIE, 9051 (2014) 90511F.

4. 4. L. Gou, V. Nair, H. Mori, A. Olson, D. Swindler, and A. Devilliers, Proc. SPIE, 7972 (2011) 7972P.

5. 5. T. Umeda, S. Tsuzuki, and T. Numaguchi, Proc. SPIE, 7273 (2009) 72734B.

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