Start-up performance and pattern defectivity improvement using 2nm rated nylon filter developed with lithography filtration expertise

Author:

Umeda Toru,Shiu Eric,Mizuno Takehito,Nakagawa Hisashi,Murakami Tetsuya,Tsuzuki Shuichi

Publisher

SPIE

Reference7 articles.

1. Filtration condition study for enhanced microbridge reduction;Umeda,2009

2. Defect reduction by using point-of-use filtration in new coater/developer;Umeda,2009

3. Microbridge and e-test opens defectivity reduction via improved filtration of photolithography fluids;Sevegney,2009

4. Advanced lithographic filtration and contamination control for 14nm node and beyond semiconductor processes;Varanasi,2017

5. Enhanced Cleaning for the Point-of-Use Filter and its Effectiveness on Wafer Defectivity in Immersion ArF Lithography Process

Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Metal Ions Removal from Organic Solvents using MXene-Based Membranes;ACS Applied Engineering Materials;2023-10-11

2. High performance filtration for bulk materials: a novel HDPE membrane filter designed for EUV Lithography;Advances in Patterning Materials and Processes XXXVIII;2021-02-22

3. Defectivity modulation in EUV resists through advanced filtration technologies;Advances in Patterning Materials and Processes XXXVII;2020-03-23

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