Dissolution Rate Monitor Tool to Measure EUV Photoresist Dissolution-Reference-Cited by-同舟云学术

Dissolution Rate Monitor Tool to Measure EUV Photoresist Dissolution

Published:2017 Issue:6 Volume:30 Page:675-681
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Vesters Yannick¹²,De Simone Danilo¹,De Gendt Stefan¹²

Affiliation:

1. Imec

2. KU Leuven, Department of Chemistry

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/30/6/30_675/_pdf

Reference21 articles.

1. 1. ASML, “EUV production insertion: factors to watch”, Press Release, 14 Apr. 2016

2. 2. T. Itani, “Closing Address”, EUVL symposium 2016, (2016) Hiroshima.

3. 3. D. De Simone, Y. Vesters, A. Shehzad, G. Vandenberghe, P. Fouber, C. Beral, D. Van den Heuvel, M. Mao, and F. Lazzarino, Proc. SPIE, 10143 (2017) 1014323.

4. 4. G. M. Gallatin, P. P. Naulleau, and R. L. Brainard, Proc. SPIE, 8322 (2012) 83221C.

5. 5. C. N. Anderson, P. P. Naulleau, and D. Niakoula, J. Vac. Sci. Technol. B, 26 (2008) 2295.

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Three-dimensional modeling of EUV photoresist using the multivariate Poisson propagation model;Journal of Micro/Nanopatterning, Materials, and Metrology;2021-07-02

2. 3D modeling of EUV photoresist using the multivariate Poisson propagation model;Extreme Ultraviolet (EUV) Lithography XII;2021-02-22

3. In-situ characterization of the development step of high-resolution e-beam resists;Micro and Nano Engineering;2020-11

4. WITHDRAWN: In-situ characterization of the development step of high-resolution e-beam resists;Microelectronic Engineering;2020-07

5. Development of main chain scission type photoresists for EUV lithography;International Conference on Extreme Ultraviolet Lithography 2019;2019-09-26