Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise-Reference-Cited by-同舟云学术

Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise

Published:2008-11 Issue:6 Volume:26 Page:2295-2299
ISSN:1071-1023
Container-title:Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
language:en
Short-container-title:J. Vac. Sci. Technol. B

Author:

Anderson Christopher N.¹,Naulleau Patrick P.²,Niakoula Dimitra²,Hassanein Elsayed³,Brainard Robert³,Gallatin Gregg⁴,Dean Kim⁵

Affiliation:

1. Applied Science & Technology Graduate Group, University of California, Berkeley, Berkeley, California 94720

2. Center for X-ray Optics, Lawrence Berkeley National Laboratory, 1 Cyclotron Road, Berkeley, California 94720

3. College of Nanoscale Science and Engineering, University at Albany, New York 12203

4. Applied Math Solutions, LLC, Virginia 20170

5. SEMATECH, Austin, Texas 78741

Funder

NSF

DOE

Publisher

American Vacuum Society

Subject

Electrical and Electronic Engineering,Condensed Matter Physics

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