Novel Spin on Planarization Technology by Photo Curing SOC (P-SOC)-Reference-Cited by-同舟云学术

Novel Spin on Planarization Technology by Photo Curing SOC (P-SOC)

Author:

Endo Takafumi¹,Sakamoto Rikimaru¹,Hashimoto Keisuke¹,Saito Daigo¹,Nishimaki Hirokazu¹,Karasawa Ryo¹,Tokunaga Hikaru¹

Affiliation:

1. Semiconductor Materials Research Department, Materials Research Laboratories, Nissan Chemical Industries, Ltd.

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

Reference4 articles.

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2. 2. F. Iwao, S. Shimura, H. Kyouda, K. Oyama, S. Yamauchi, A. Hara, S. Natori, and H. Yaegashi, Proc. SPIE, 8325 (2012) 832525.

3. 3. K. Oyama, S. Yamauchi, A. Hara, S. Natori, and H. Yaegashi, Proc. SPIE, 8682 (2013) 86820C.

4. 4. Y. Someya, T. Shinjo, K. Hashimoto, H. Nishimaki, R. Karasawa, R. Sakamoto, and T. Matsumoto, Proc. SPIE, 8325 (2012) 83250U.

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2. Improvement study of Mitsui SOC materials for multilayer lithography process;Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology;2019-06-27