Synthesis and Directed Self-Assembly of Modified PS-<i>b</i>-PMMA for Sub-10 nm Nanolithography-Reference-Cited by-同舟云学术

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Synthesis and Directed Self-Assembly of Modified PS-b-PMMA for Sub-10 nm Nanolithography

Published:2017 Issue:1 Volume:30 Page:83-86
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Li Xuemiao¹,Li Jie¹,Deng Hai¹

Affiliation:

1. Department of Macromolecular Science, State Key Laboratory of Molecular Engineering of Polymers，Fudan University

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/30/1/30_83/_pdf

Reference14 articles.

1. 1. H.-C. Kim, S.-M. Park, and W. D. Hinsberg, Chem. Rev., 110 (2010) 146.

2. 2. D. J. C. Herr, J. Mater. Res., 26 (2011) 122.

3. 3. S.-J. Jeong, J. E. Kim, H.-S. Moon, B. H. Kim, and S. O. Kim, Nano Lett., 9 (2009) 2300.

4. 4. J. G. Kennemur, L. Yao, F. S. Bates, and M. A. Hillmyer, Macromolecules 47(2014), 1411.

5. 5. C. M. Bates, M. J. Maher, D. W. Janes, C. J. Ellison, and C. G. Willson, Macromolecules, 47 (2014) 2.

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3. Ultra-Fast Block Copolymers for Sub-5 nm Lithographic Patterning;Journal of Photopolymer Science and Technology;2018-06-25

4. The study of typical failure modes and failure mechanism of polymer materials;IOP Conference Series: Materials Science and Engineering;2017-09

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