Fast self-assembly of polystyrene-b-poly(fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications-Reference-Cited by-同舟云学术

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Fast self-assembly of polystyrene-b-poly(fluoro methacrylate) into sub-5 nm microdomains for nanopatterning applications

Published:2019 Issue:9 Volume:7 Page:2535-2540
ISSN:2050-7526
Container-title:Journal of Materials Chemistry C
language:en
Short-container-title:J. Mater. Chem. C

Author:

Li Xuemiao¹²³⁴^ORCID,Li Jie¹²³⁴,Wang Chenxu¹²³⁴,Liu Yuyun¹²³⁴,Deng Hai¹²³⁴

Affiliation:

1. Department of Macromolecular Science and State Key Laboratory of Molecular Engineering of Polymers

2. Fudan University

3. Shanghai 200433

4. P. R. China

Abstract

Block copolymers with perfluoroalkyl side-chains can self-assemble rapidly at moderate temperatures to yield sub-5 nm domains.

Funder

Ministry of Science and Technology of the People's Republic of China

Fudan University

Science and Technology Commission of Shanghai Municipality

Publisher

Royal Society of Chemistry (RSC)

Subject

Materials Chemistry,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2019/TC/C8TC06480F

Reference72 articles.

1. Theory of block copolymer interfaces in the strong segregation limit

2. Nanoscopic Templates from Oriented Block Copolymer Films

3. Block copolymers and conventional lithography

4. Self-assembly of block copolymer thin films

5. Functional nanomaterials based on block copolymer self-assembly

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