Author:
Thakerlay James W.,Nassar Roger A.,Spear-Alfonso Kathleen,Brainard Robert,Goldfarb Dario,Wallow Thomas,Wei Yayi,Montgomery Warren,Petrillo Karen,Wood Robert,Koay Chief-seng,Mackey Jeff,Naulleau Patrick,Pierson Bill,Solak Harun H.
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference18 articles.
1. Evaluation of High and Low Activation Resists for EUV Lithography
2. Chemical amplification in the design of dry developing resist materials
3. Environmentally stable chemical amplification positive resist: principle, chemistry, contamination resistance, and lithographic feasibility.
4. (c) A. A. Lamola, C. R. Szmanda, J. W. Thackeray, "Chemically Amplified Resists," Solid State Technology, August 1991, pp. 53-60.
5. 3. (a) R. Kunz, "Photoresist outgassing: A potential Achilles heel for short wavelength optical lithography?", Proc. SPIE, 5376, pp. 1-15 (2004).
Cited by
38 articles.
订阅此论文施引文献
订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献