Author:
Tran Hoang,French Roger H.,Adelman Douglas J.,Feldman Jerald,Qiu Weiming,Wheland Robert C.,Brubaker Luke W.,Fischel Brian E.,Fones Barbara B.,Lemon Michael F.,Yang Min K.,Nagao Osami,Kaku Mureo,Mocella Michael,Schmieg John J.
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference16 articles.
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2. Imaging of 32-nm lines and spaces using 193-nm immersion interference lithography with second-generation immersion fluids to achieve a numerical aperture of 1.5 and a of 0.25
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