Status of High-Index Materials for Generation-Three 193nm Immersion Lithography
-
Published:2007
Issue:5
Volume:20
Page:643-650
-
ISSN:0914-9244
-
Container-title:Journal of Photopolymer Science and Technology
-
language:en
-
Short-container-title:J. Photopol. Sci. Technol.
Author:
Zimmerman Paul A.1, Peski Chris van1, Rice Bryan1, Byers Jeff1, Turro Nicholas J.2, Lei Xuegong2, Gejo Juan Lopez2, Liberman Vladmir3, Palmacci Steve3, Rothchild Mordy3, Whitker Andrew4, Blakey Idriss4, Chen Lan4, Dargaville Bronwin4, Liu Heping4
Affiliation:
1. SEMATECH 2. Columbia University 3. MIT-LL 4. University of Queensland
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference17 articles.
1. 1) R.H. French, V. Liberman, H.V. Tran, J. Feldman., D.J. Adelman, R.C. Wheland,W. Qiu, S.J. McLain, O. Nagao, M. Kaku, M. Mocella, M.K. Yang, M.F. Lemon, L. Brubaker, A.L. Shoe, B. Fones, B.E. Fischel1, K. Krohn, D. Hardy, C.Y. Chen, "High Index Immersion Lithography with 2nd Generation Immersion Fluids To Enable Numerical Apertures of 1.55 For Cost Effective 32 nm Half Pitches," Proc. SPIE Opt. Microlitho., In Press (2007). 2. 2) S. Kusumoto, M. Shima, Y. Wang, T. Shimokawa, H. Sato, K. Hieda, "Advanced materials for 193 nm immersion lithography," Poly. Adv. Tech., Volume 17, Issue 2 , 122 - 130, (2006). 3. 3) B.W. Smith, J. Zhou, F. Fan, A. Bourov, "Inorganic immersion fluids for ultrahigh numerical aperture 193 nm lithography," Applied Optics, Vol. 45, Issue 13, pp. 3077-3082 (2006). 4. 4) W. Conley, S. Warrick, C. Garza, P-J Goirand. J.-W Gemmink, D.Van Steenwinckel, "Application of Beyond Water Immersion to Device level Imaging," 3rd Intl. Symp. on Immersion Lithography, Kyoto, Japan, Oct 2006. 5. 5) B.W. Smith, J. Zhou, "Snell or Fresnel - The influence of material index on hyper NA lithography,"Proc. SPIE Optical Microlithography, In Press (2007)
Cited by
16 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
|
|