100 nm period grating by high-index phase-mask immersion lithography-Reference-Cited by-同舟云学术

100 nm period grating by high-index phase-mask immersion lithography

Published:2010-05-06 Issue:10 Volume:18 Page:10557
ISSN:1094-4087
Container-title:Optics Express
language:en
Short-container-title:Opt. Express

Author:

Bourgin Yannick,Jourlin Yves,Parriaux Olivier,Talneau Anne,Tonchev Svetlen,Veillas Colette,Karvinen Petri,Passilly Nicolas,Md Zain Ahmad R.,De La Rue Richard M.,Van Erps Jürgen,Troadec David

Publisher

The Optical Society

Subject

Atomic and Molecular Physics, and Optics

Reference17 articles.

1. Blazed high-efficiency x-ray diffraction via transmission through arrays of nanometer-scale mirrors

2. Resist trimming etch process control using dynamic scatterometry

3. Subwavelength surface-relief gratings for stellar coronagraphy

4. Submicrometer gratings for solar energy applications

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