Author:
Yamamoto Hitoshi,Asakura Toshikage,Nishimae Yuichi,Matsumoto Akira,Tanabe Junichi,Birbaum Jean-Luc,Murer Peter,Hinterman Tobias,Ohwa Masaki
Publisher
Technical Association of Photopolymers, Japan
Subject
Materials Chemistry,Organic Chemistry,Polymers and Plastics
Reference14 articles.
1. 1. For example, R. Dammel, Diazonaphthoquinone-based Resists, pp. 9-96, SPIE Optical Engineering Press, Washington, D. C., 1993.
2. Chemical amplification resists: Inception, implementation in device manufacture, and new developments
3. Cationic polymerization — Iodonium and sulfonium salt photoinitiators
4. Photoacid and photobase generators: Chemistry and applications to polymeric materials
5. 4. G. Buhr, R. Dammel, C. R. Lindley, Polym. Mater. Sci. Eng. 61 (1989) 269-77.
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