Effect of Initial Dispersion of Protected Units on Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resists-Reference-Cited by-同舟云学术

Effect of Initial Dispersion of Protected Units on Line Edge Roughness of Chemically Amplified Extreme Ultraviolet Resists

Published:2013 Issue:5 Volume:26 Page:643-648
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Kozawa Takahiro

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

https://www.jstage.jst.go.jp/article/photopolymer/26/5/26_643/_pdf

Reference28 articles.

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