Optimizing Two-Photon Initiators and Exposure Conditions for Three-Dimensional Lithographic Microfabrication.-Reference-Cited by-同舟云学术

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Optimizing Two-Photon Initiators and Exposure Conditions for Three-Dimensional Lithographic Microfabrication.

Published:2001 Issue:4 Volume:14 Page:657-668
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Kuebler Stephen M.,Rumi Mariacristina,Watanabe Toshiyuki,Braun Kevin,Cumpston Brian H.,Heikal Ahmed A.,Erskine Lael L.,Thayumanavan S.,Barlow Stephen,Marder Seth R.,Perry Joseph W.

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer1988/14/4/14_4_657/_pdf

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