Interaction Analysis of DI-water/Air/ArF Resist System using Atomic Force Microscope-Reference-Cited by-同舟云学术

Interaction Analysis of DI-water/Air/ArF Resist System using Atomic Force Microscope

Published:2005 Issue:3 Volume:18 Page:373-380
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Niiyama Takayoshi,Kawai Akira

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/18/3/18_3_373/_pdf

Reference13 articles.

1. Micro Bubbles Captured at Micro Defect on Resist Film

2. 2. A. Kawai and A. Ishikawa, Ext. Abstr. 52nd Spring Meet. Japan Society of Applied Physics and Related Societies, Saitama, March, (2005) p.840.

3. 3. T. Niiyama, A. Ishikawa and A. Kawai, Ext. Abstr. 52nd Spring Meet. Japan Society of Applied Physics and Related Societies, Saitama, March, (2005) p.841.

4. Mechanism of Resist Pattern Collapse during Development Process

5. Atomic Force Microscope

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