Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography-Reference-Cited by-同舟云学术

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Graded Spin-on Organic Bottom Antireflective Coating for High NA Immersion Lithography

Published:2008 Issue:3 Volume:21 Page:397-404
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Goldfarb Dario L.,Vyklicky Libor,Burns Sean D.,Petrillo Karen,Arnold John,Lisi Anthony,Pfeiffer Dirk,Sanders Daniel D.,Allen Robert D.,Medeiros David R.,Owe-Yang Dah Chung,Noda Kazumi,Tachiban Seiichiro,Shirai Shozo

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/21/3/21_3_397/_pdf

Reference17 articles.

1. 1. D.J. Abdallah et al., Proc. SPIE, 5753 (2005) 417.

2. 2. D.C. Owe-Yang et al., Proc. SPIE, 5753 (2005) 1216.

3. 3. M. Burkhardt et al., Proc. SPIE, 6520 (2007) 65200K.

4. 4. T. Brunner et al., Proc. SPIE, 4691 (2002) 1.

5. 5. S.D. Burns et al., Proc. SPIE, 6153 (2006) 61530K.

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. The Photopolymer Science and Technology Award;Journal of Photopolymer Science and Technology;2019-06-24

2. The Photopolymer Science and Technology Award;Journal of Photopolymer Science and Technology;2009

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