Development of Spin-on High Carbon Hard Masks for High Resolution Photolithography-Reference-Cited by-同舟云学术

Development of Spin-on High Carbon Hard Masks for High Resolution Photolithography

Published:2011 Issue:5 Volume:24 Page:503-510
ISSN:0914-9244
Container-title:Journal of Photopolymer Science and Technology
language:en
Short-container-title:J. Photopol. Sci. Technol.

Author:

Lin Guanyang,Rahman M. Dalil,Caho Joon Yeon,Sahn Jianhui,Yi Yi,Mckenzie Douglas

Publisher

Technical Association of Photopolymers, Japan

Subject

Materials Chemistry,Organic Chemistry,Polymers and Plastics

Link

http://www.jstage.jst.go.jp/article/photopolymer/24/5/24_5_503/_pdf

Reference11 articles.

1. 1. C. Oh, D. S. Uh, D. H. Kim, J. K. Lee, H. C. Yun, I. Nam, M. S. Kim, K. H. Yoon, K. H. Hyung, N. Tokareva, H. S. Cheon, J. S. Kim, T. W. Chang, Prof. of SPIE 6519 (2007) 65192R.

2. 2. C. Oh, J. K. Lee, M. S. Kim, K. H. Yoon, H. S. Cheon, N. Tokareva, J. Y. Song, J. S. Kim, T. W. Chang, Proc. of SPIE 6923 (2008) 69232V.

3. 3. H. S. Cheon, K. H. Yoon, M. S. Kim, S. B. Oh, J. Y. Song, N. Tokareva, J. S. Kim, T. Chang, Proc. of SPIE 7140 (2008) 71402R.

4. 4. H. S. Cheon, K. H. Yoon, M. S. Kim, S. B. Oh, J. Y. Song, N. Tokareva, J. S. Kim, T. Chang, Proc. of SPIE 7273 (2009) 727310.

5. 5. R. R. Kunz, S. C. Palmateer, A. R. Forte, R. D. Allen, G. M. Wallraff, R. A. DiPietro, D. C. Hofer, Proc. of SPIE 2724 (1996) 365.

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