A route for industry compatible directed self-assembly of high-chi PS-PDMS block copolymers
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SPIE
Reference27 articles.
1. Progress and issues in e-beam and other top down nanolithography
2. Extreme ultraviolet lithography and three dimensional integrated circuit—A review
3. Patterning with block copolymer thin films;Segalman,2005
4. Molecularly Functionalized Silicon Substrates for Orientation Control of the Microphase Separation of PS-b-PMMA and PS-b-PDMS Block Copolymer Systems
5. Phase Diagram of Diblock Copolymers Confined in Thin Films
Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Strategy for Enhancing Ultrahigh-Molecular-Weight Block Copolymer Chain Mobility to Access Large Period Sizes (>100 nm);Langmuir;2020-11-11
2. Engineering block copolymer materials for patterning ultra-low dimensions;Molecular Systems Design & Engineering;2020
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