1. 1. Polymers for Microelectronics and Nano-electronics; Lin, Q.; Pearson, R. A.; Hedrick, J. C., Eds.; ACS Symposium Series 874, American Chemical Society: Washington DC, 2004.
2. 2. Micro-and Nanopatterning Polymers; Ito, H.; ACS Symposium Series 706, American Chemical Society: Washington DC, 1998.
3. 3. N. Yoda, H. Hiramoto, J. Macromol. Sci. Chem., A21, 1641 (2001).
4. A Novel Mechanism to Afford Photosensitivity to Unfunctionalized Polyimides: Negative-tone Reaction Development Patterning
5. 5. Y. Nakamura, A. Takahashi, T. Oyama, Polym. Prepr., Jpn., 50, 4127 (2010).